Toshiba working on 25nm flash memory – commercial availability expected later this year

April 2, 2010, By Thomas Antony

On Friday, Toshiba announced that they were in the early stages of preparing for the manufacture of 25 nm memory chips. The world’s second largest NAND flash memory maker after Samsung, has already ordered the required equipment from Netherland-based ASML according to Nikkei business daily. Currently generation memory chips use 32 nm – 43 nm circuitry. The narrower circuitry would help manufacturers pack much more memory into a smaller area and reduce costs at the same time.

Toshiba plans to begin output of NAND chips with circuitry widths in the upper 20 nanometre range soon, while production of chips with circuitry widths in the lower 20 nanometres is slated to start as early as 2012, the Nikkei said. The equipment being bought from ASML will use cutting edge extreme ultraviolet (EUV) lithography technology to form the narrower circuitry onto the silicon wafers.

The advancement is likely to find its way into the upcoming handheld devices such as the next generation iPods and iPhones.   This could result in 128GB flash memory modules by next year. Toshiba is also involved in the development of the Cell processor used in the Sony PS3 and a 25nm process will clear the way for cooler, faster and smaller versions of the chip.

Via SlashGear

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